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The "ExLASER" is a multi purpose rapid heating machine with LASER. |
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| Features |
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Super high speed. Rapid heat-up, Rapid cool-down. |
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2 inch substrate can be evenly heated by ONE SHOT. |
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Only the target can be heated directly. |
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Temperature control is available depending on each thermal process. |
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Only the target can be heated Energy-saving. |
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| Applications |
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Substrate heating in MBE machine. |
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Wafer annealing (SiC , GaAS etc. ) |
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Available for surface annealing for top layer of multi layer device with device scaling. |
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...etc. |
| Sales reference |
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Japan Atomic Energy Agency
Laser power : 100W
Dimensions : H251×W200×D253（mm） |
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